Excerpt from Methods of Measurement for Semiconductor Materials, Process Control, and Devices: Quarterly Report, October 1 to December 31, 1970 This is the tenth quarterly report to the sponsors of the Joint Program on Methods of Measurement for Semiconductor Materials, Process Control, and Devices. It summarizes work on a wide variety of measure ment methods that are being studied at the National Bureau of Standards. Since the Program is a continuing one, the results and conclusions re ported here are subject to ...
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Excerpt from Methods of Measurement for Semiconductor Materials, Process Control, and Devices: Quarterly Report, October 1 to December 31, 1970 This is the tenth quarterly report to the sponsors of the Joint Program on Methods of Measurement for Semiconductor Materials, Process Control, and Devices. It summarizes work on a wide variety of measure ment methods that are being studied at the National Bureau of Standards. Since the Program is a continuing one, the results and conclusions re ported here are subject to modification and refinement. Fourteen tasks, each directed toward a particular material or device property or measurement technique, have been identified as parts of the Program. The report is subdivided according to these tasks. Highlights of activity during the quarter are given in Section 2. Section 3 deals with tasks on methods of measurement for materials; Section 4, with those on methods of measurement for process control; and Section 5, with those on methods of measurement for devices. References for each section are listed in a separate subsection at the end of that section. About the Publisher Forgotten Books publishes hundreds of thousands of rare and classic books. Find more at ... This book is a reproduction of an important historical work. Forgotten Books uses state-of-the-art technology to digitally reconstruct the work, preserving the original format whilst repairing imperfections present in the aged copy. In rare cases, an imperfection in the original, such as a blemish or missing page, may be replicated in our edition. We do, however, repair the vast majority of imperfections successfully; any imperfections that remain are intentionally left to preserve the state of such historical works.
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