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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Modeling of Film Deposition for Microelectronic Applications

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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Modeling of Film Deposition for Microelectronic Applications - Ulman, Abraham (Editor), and Rossnagel, Stephen (Editor), and Francombe, Maurice H (Editor)
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This serial contains studies of the properties of various thin films materials and systems. This volume presents five different models of computer simulation techniques to thin film deposition as applied to modern microelectronics. The book focuses on the simulation and experimental confirmation of how surfaces evolve on a microscopic scale during thin film processing in relation to semiconductor dimensions. There are two general classes of model: the molecular dynamics model and the shock-tracking model, and several ...

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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Modeling of Film Deposition for Microelectronic Applications 1996, Academic Press, London

ISBN-13: 9780125330220

Hardcover