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Modeling of Chemical Vapor Deposition of Tungsten Films
by Kleijn, Chris R., and Werner, Christoph
2013, Birkhauser Verlag AG
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3034877439
ISBN-13:
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Modeling of Chemical Vapor Deposition of Tungsten Films Progress in Numerical Simulation for Microelectronics
by Chris R. Kleijn
2013, Birkhauser Basel
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3034877439
ISBN-13:
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Softcover reprint of the original 1st edition 1993
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Modeling of Chemical Vapor Deposition of Tungsten Films
by Kleijn, Chris R., and Werner, Christoph
2013, Birkhauser Verlag AG
ISBN-13:
9783034877435
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Edition:
2013, Birkhauser Verlag AG
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Details:
ISBN:
3034877439
ISBN-13:
9783034877435
Publisher:
Birkhauser Verlag AG
Published:
2013
Language:
English
Alibris ID:
17654849948
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New. Progress in Numerical Simulation for Microelectronics . 139 p. Intended for college/higher education audience.
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