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In Situ Process Diagnostics and Modeling: Volume 569 - Auciello, Orlando (Editor), and Krauss, Alan R. (Editor), and Irene, Eugene A. (Editor)
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Fabrication of future generations of advanced film-based devices will require monitoring of ultrathin layers with sharp interfaces in which the layer thickness may reach atomic dimensions. It therefore becomes increasingly more important to be able to monitor film-deposition processes in situ and in real time under different background pressure conditions. Diffusion or surface segregation processes relevant to device fabrication also need to be characterized. To these ends, a variety of complimentary in situ, real-time ...

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In Situ Process Diagnostics and Modeling: Volume 569 1999, Materials Research Society, New York

ISBN-13: 9781558994768

Hardcover