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In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502

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In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502 - Rosenthal, Peter A. (Editor), and Duncan, Walter M. (Editor), and Woollam, John A. (Editor)
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This book, first published in 1998, focuses on the rapidly developing field of sensor technology for process monitoring and control during fabrication of advanced materials and structures. Research in sensor driven, closed-loop control of the fabrication process (i.e., process-state monitoring), as well as product-state (e.g., wafer-state) monitoring are discussed. Featured are process techniques that include chemical vapor deposition (CVD), metalorganic chemical vapor deposition (MOCVD), plasma-enhanced chemical vapor ...

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In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502 1998, Materials Research Society, New York

ISBN-13: 9781558994072

Hardcover