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Electromigration in Metals: Fundamentals to Nano-Interconnects

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Electromigration in Metals: Fundamentals to Nano-Interconnects - Ho, Paul S., and Hu, Chao-Kun, and Gall, Martin
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Learn to assess electromigration reliability and design more resilient chips in this comprehensive and practical resource. Beginning with fundamental physics and building to advanced methodologies, this book enables the reader to develop highly reliable on-chip wiring stacks and power grids. Through a detailed review on the role of microstructure, interfaces and processing on electromigration reliability, as well as characterisation, testing and analysis, the book follows the development of on-chip interconnects from ...

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Electromigration in Metals: Fundamentals to Nano-Interconnects 2022, Cambridge University Press, Cambridge

ISBN-13: 9781107032385

Hardcover