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Principles of Chemical Vapor Deposition
by Dobkin, D.M., Zuraw, M.K.
2010, Springer
ISBN-13:
9789048162772
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Add this copy of Principles of Chemical Vapor Deposition to cart. $183.72, very good condition, Sold by Books From California rated 4.0 out of 5 stars, ships from Simi Valley, CA, UNITED STATES, published 2010 by Springer.
Details: ISBN:
9048162777
ISBN-13:
9789048162772
Publisher:
Springer
Published:
2010
Language:
English
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Principles of Chemical Vapor Deposition
by Dobkin, D.M., and Zuraw, M.K.
2010, Springer
ISBN-13:
9789048162772
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Details: ISBN:
9048162777
ISBN-13:
9789048162772
Publisher:
Springer
Published:
2010
Language:
English
Alibris ID:
17916904043
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Principles of Chemical Vapor Deposition
by Dobkin, D.M., and Zuraw, M.K.
2010, Springer
ISBN-13:
9789048162772
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Edition: 2010, Springer
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Available Copies: 10+
Details: ISBN:
9048162777
ISBN-13:
9789048162772
Publisher:
Springer
Published:
2010
Language:
English
Alibris ID:
11487782205
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Seller's Description: New. Print on demand XI, 273 p. Intended for professional and scholarly audience.
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