Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.
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Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.
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Add this copy of Applications of Plasma Processes to Vlsi Technology to cart. $8.72, Sold by Books On The Run rated 5.0 out of 5 stars, ships from Ocala, FL, UNITED STATES, published 1985 by Wiley-Interscience.
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Reader copy. 1985 hardcover no dj xlibrary copy withdrawn stamp on edge of pages/ in book clean text has age spots has book plate and card pocket 394 pages: H-10.
Add this copy of Applications of Plasma Processes to Vlsi Technology to cart. $10.90, fair condition, Sold by Bookmans rated 4.0 out of 5 stars, ships from Tucson, AZ, UNITED STATES, published 1985 by John Wiley & Sons.
